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In-Situ 4000 Process Monitor Application Checklist

Please respond to the following questions as completely as possible to ensure process compatibility.

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1) General process type: (e.g. MBE, MOCVD, VPE, etc.)

2) Deposition chamber manufacturer & model number (Observation Geometry), view-port diameter, and material:

3) Substrate material: (e.g. Silicon, GaAs, etc.)

4) Substrate size and thickness:

5) Film material structure:

6) Deposition rates:

7) Substrate temperature range of interest:

8) How is the substrate heated? (e.g. conductive, radiative, etc.)

9) Which of the following are required monitor parameters:
Substrate temperature Yes    No
Film thickness Yes    No
Film index of refraction Yes    No

10) Does the substrate move during deposition? Yes    No

11) Is there clearance for the optical head (125x125x150 mm) near the viewport? Yes    No

12) Are there other sources of light or heat in the vacuum chamber? (e.g. filaments, effusion cells)

Please add any comments, sketches, or notes:

   

 
 
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